E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components StdTpc-Wafer Shipping System providing a powerful and complementary

providing a powerful and complementary approach to traditional feedback control and process stabilization approaches

The purpose of this Document is to provide guidelines for organosilicate precursors used in Low K CVD processes and to standardize testing procedures to support those requirements

and a specification for glass as substrate for semiconductor applications with or without openings has been laid out in SEMI 3D16

By this Standard

This test method was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee

E19500 - SEMI E195 - Test Method Using Adhesive Replacement Substrates to Assess Particulate Surface Contamination on Critical Chamber Components StdTpc-Wafer Shipping System providing a powerful and complementary1 Purpose 1. 1 This Test Method describes a quantitative analysis method to measure the ISO 14644 9 surface cleanliness for particle concentration (SCP) of a critical chamber component (CCC) by means of an adhesive replacement substrate (ARS), which removes particles from the CCC surfaces of interest. The ARS is subsequently measured with a scanning surface inspection system (SSIS), typically a scatterometer, for particle counting, and with scanning