P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist StdVol-Microlithography This Test Method covers the

This Test Method covers the VA content test using a TGA instrument

1  EtherNet/IP is a communication system suitable for use in industrial environments

nor does it make recommendations regarding decisions about the process cycle or equipment used to produce the thin film that was measured

본 가이드라인의 목적은 일관성 있고 실질적인 방법으로 위험 확인

and provide a common validation criteria for ATE suppliers

P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist StdVol-Microlithography This Test Method covers theThis test method was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www. semi. org August 2004; to be published November 2004. Originally published September 1998. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to