P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様 Revision:SEMI P40-1103 - Superseded SEMI M49 — Guide for

SEMI M49 — Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 22 nm Technology Generations

commonly called metric) units shall be used

This Guide provides definitions used for identification of UPW system components and other commonly used terms associated with the semiconductor facility water systems

The purpose is to:

SEMI G75-0698 (Reapproved 0615)

P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様 Revision:SEMI P40-1103 - Superseded SEMI M49 — Guide forGlobal Micropatterning CommitteeNorth American Micropatterning Committee200393North American Regional Standards Committee20039www. semi. org200311 EUVL Referenced SEMI Standards SEMI P37 Specification for Extreme Ultraviolet Lithography Mask Substrates SEMI P38 Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks