P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML Revision:SEMI P46-1111 - Inactive 1-0524 (technical revision)

1-0524 (technical revision)

In the monocrystalline form one crystallographic orientation describes the whole wafer and in the multicrystalline case there is more than one crystallographic orientation present

which define a thickness range as well as an upper limit for the total thickness variation (TTV)

This Test Method defines a particle shedding evaluation method for 25 cm filter cartridges of various media (e

This Standard was technically approved by the Flat Panel Display – Color Global Technical Committee

P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML Revision:SEMI P46-1111 - Inactive 1-0524 (technical revision)This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 12, 2011. Available at www. semiviews. org and www. semi. org in November 2011; originally published July 2006. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards