M06300 - SEMI M63 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様 Revision:SEMI M63-0306 - Superseded Activation can take up to

Activation can take up to 3 business days

SEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Slices and Wafers by a Noncontact Scanning Method

SEMI E147 — Guide for Equipment Data Acquisition (EDA)

equipment for different substrate sizes will become simpler

This Specification may be applied to manufacturing process

M06300 - SEMI M63 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様 Revision:SEMI M63-0306 - Superseded Activation can take up toglobal Compound Semiconductor Materials Committee2006116global Audits and Reviews Subcommittee20062www. semi. org20063CD ROM E20068R2 2 Referenced SEMI Standards None.