M02000 - SEMI M20 - ウェーハ座標システムの確立の作業方法 Revision:SEMI M20-1110 - Superseded without requiring an interruption of

without requiring an interruption of the process tools using the UHP gases of interest

Standardizing INAA for application to silicon will remove differences in the analytical approach and will establish a common reference for the analyses

and to allow them to be easily exchanged

and 150 mm (6 in

either a symmetrical five-point or nine-point pattern is used

M02000 - SEMI M20 - ウェーハ座標システムの確立の作業方法 Revision:SEMI M20-1110 - Superseded without requiring an interruption ofNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI x y xyrq zzx y zr q z x yr q 1 x y z r q z Referenced SEMI Standards (purchase separately) SEMI E5 Specification for SEMI Equipment Communications Standard 2 Message Content (SECS II) SEMI M1 Specification for Polished Single Crystal