M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography Revision:SEMI M43-0418 (Reapproved 0923) - Current This Standard was technically approved

This Standard was technically approved by the global Gases Technical Committee

can be used to facilitate inclusion of such additional physical properties and suitable test methods as may be required in the Specification

付属書1では，¶ 12

There is no spatial information available and the VPD pre-concentration of metals is dependent upon the chemistry of each metal

1  Some terms are specialized to a semiconductor manufacturing environment

M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography Revision:SEMI M43-0418 (Reapproved 0923) - Current This Standard was technically approvedThis Guide provides a framework for reporting of nanotopography surface features on silicon wafers. This Guide addresses reporting the characterization of nanotopography surface features found on wafer surfaces. Nanotopography is the non planar deviation of the whole front wafer surface within a spatial wavelength range of approximately 0. 2 to 20 mm and within the fixed quality area (FQA). Typical examples include dips, bumps or waves on the wafer