P02500 - SEMI P25 - 焦点深度および最適焦点深度（仕様） Revision:SEMI P25-94 (Reapproved 1104) - Inactive To avoid any disturbance of

To avoid any disturbance of future development and to facilitate interchangeability of diaphragm valves

2-0698 (Reapproved 0706)

Where there is not significant compensation by impurities of the opposite conductivity type

mounted on the jig to process semiconductor devices

3千帕(一大氣壓)以下的製程化學品鋼瓶。

P02500 - SEMI P25 - 焦点深度および最適焦点深度（仕様） Revision:SEMI P25-94 (Reapproved 1104) - Inactive To avoid any disturbance ofNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeNorth American Microlithography Committee2004816North American Regional Standards Committee20049www. semi. org200411 1994 NOTICE: This Standard or Safety Guideline has an Inactive Status because the