E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles StdTpc-Automation Technology This Specification defines equipment metadata

This Specification defines equipment metadata based on SEMI E125-0710 and SEMI E120-0310

Where material contains other material (such as carriers containing wafers)

Information on the mapping of processing management services to special protocols (e

a particular subset of properties and respective parameters will be considered relevant by the purchaser

SEMI G18-86 (technical revision)

E15200 - SEMI E152 - Specification for Mechanical Features of EUV Pod for 150 mm EUVL Reticles StdTpc-Automation Technology This Specification defines equipment metadataThis Standard specifies EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6 inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL. This Standard is intended to set an appropriate level of specification that places minimal limits on innovation while ensuring modularity and