Si Wafer (111) 2" dia x 0.5mm, 1SP, FZ, Undoped, R> 10,000 ohm-cm - SIUc50D05C1R10000 YSZ (Yittrium stabilized ZrO2) Thickness of Cu polycrystalline <111>
$67.58
Description
Thickness of Cu polycrystalline <111> film: 100 nm
15 NFMO + Hard Carbon
Dimensions 207 x 84 x 35
For pouch cell with multiple layers
Syringe needle head suggested having 100-200mm distance with collector drum
Si Wafer (111) 2" dia x 0.5mm, 1SP, FZ, Undoped, R> 10,000 ohm-cm - SIUc50D05C1R10000 YSZ (Yittrium stabilized ZrO2) Thickness of Cu polycrystalline <111>Single crystal Si, (FZ) Conductive type: Undoped Resistivity: > 10000 ohm cm Size: 2" diameter x 0. 5mm Orientation: (111) Polish: One side polished Surface roughness: < 5A Optional: you may need tool below to handle the wafer ( click picture to order ) Other Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater
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