MgO (100) Epi polishing wafer 2" Dia x0.5mm, 2SP - MGa50D05C2US CdTe & CdZnTe/CZT

MgO (100) Epi polishing wafer 2" Dia x0.5mm, 2SP - MGa50D05C2US CdTe & CdZnTe/CZTSpecifications of MgO substrate Size: 2" diameter x 0. 5mm + _ 0. 05 mm Orientation: (100) + 0. 5 Deg Polish: Two sides EPI polished by CMP technology with minimum sub surface damage. Surface finish (RMS or Ra): < 10A Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting method and nature

Size: 25mm  Diameter   x 0

Net Weight 11

Carrier concentration:(1-3)x10^17  cm^-3

208-240VAC is also available upon request

4 x106 /cm3

125 mm (+/-0

Resistivity:>(0

EPI polished  on one side or two sides to Ra < 10 Å

UL certified 110VAC - 240VAC to 24VDC power adaptor is included

Polarity:                                   Ga-face

It is based on the principle that the mass of a deposited film on a quartz crystal can be measured by monitoring the change in crystal’s oscillating frequency

may damage the machine