Ge Substrate (110)+/- 0.7 degree 5x5x0.5 mm, 1 SP,Sb-doped ,R:0.1-0.5 ohm.cm Vacuum Pumps This aluminum foam has the

This aluminum foam has the advantages of low density

Orientation: <100> +/- 1 o

L=L1+L2:=200+125=325mm

Better mechanical strength and toughness to avoid short circuit caused by dendrite growth

which can avoid

Ge Substrate (110)+/- 0.7 degree 5x5x0.5 mm, 1 SP,Sb-doped ,R:0.1-0.5 ohm.cm Vacuum Pumps This aluminum foam has theSpecifications Growing Method: CZ Wafer Size: 5x5x0. 5 mm Surface Polishing: one side optical polished Orientation: (110) + 0. 7 degree Surface finish (RMS or Ra) : < 30A Doping: Sb doped Conductor type: N type Resistivity: 0. 1 0. 5 Ohms cm EPD: N A Package: under 1000 class clean room in wafer container Related Product Other Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater