GaN Template ( 200nm) on Silicon Wafer, GaN (N type, undoped), Si(111) N-type P-doped,10x10x0.279mm,1sp R:1-10 ohm.cm Boron-Nitride on Silicon standard microscope slides coated with

standard microscope slides coated with 50nm of gold with a 5nm Titanium adhesion layer between the glass slide surface and the gold coating

wait for 3 seconds

Adjust the height of the sputtering head in the vacuum chamber

Overall:        700 x 700 x 1540mm (L x W x H)

then the vacuum chuck will hold the tape by suction)

GaN Template ( 200nm) on Silicon Wafer, GaN (N type, undoped), Si(111) N-type P-doped,10x10x0.279mm,1sp R:1-10 ohm.cm Boron-Nitride on Silicon standard microscope slides coated withGaN Template on silicon is made by a hydride vapor phase epitaxy (HVPE) based method. During the HVPE process, HCl reacts with molten Ga to form GaCl, which in turn reacts with NH3 to form GaN. GaN template on silicon is a cost effective way to replace GaN single crystal substrate. Specifications: Nominal GaN thickness: 0. 20? m 0. 1 ? m Front Surface finish (Ga face): <1nm RMS, As grown, Back surface finish: Silicon ( 111) N type P doped R: 1 10 ohm.