InSb (100) 10x10x 0.45 mm, P type, Ge doped, 1 side polished Ga the system will automatically reconnect

the system will automatically reconnect with the PC

Warning:  You need to mill the empty jar  by  milling media before mixing material to avid surface contamination

Surface roughness:         < 8 A ( by AFM)

EPD:                                <5000cm^-2

Compatible in Ar gas glovebox

InSb (100) 10x10x 0.45 mm, P type, Ge doped, 1 side polished Ga the system will automatically reconnect10x10x0. 45 mm InSb wafer (P type, Ge doped) Size: 10x10x0. 45 mm Orientation <100> + 0. 5o with two reference flats Polishing: one side polishd ( back side etched ) Packing: Sealed under nitrogen with single wafer comtainer in 1000 class clean room Properties Growth method LEC Orientation (100) + 0. 5o Orientation Flat Doping Ge ndoped Conductivity type P type Carrier Concentration (0. 05 0. 50)E17@77K