Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon Ingestion-build-117251 What is BS EN 13796-1

What is BS EN 13796-1 - Safety requirements for carriers designed to carry persons about

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IRRADIATION for determination of the NOISE POWER SPECTRUM and LAG

4 Terms and definitions

as single or double units

Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon Ingestion-build-117251 What is BS EN 13796-11 Scope This International Standard specifies a secondary ion mass spectrometric method using magnetic sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration. This method is applicable to single crystal, poly crystal, or amorphous silicon specimens with boron atomic concentrations between 1 1016 atoms cm3 and 1 1020 atoms cm3, and to crater