Al2O3 single crystal substrate , <0001> 4"Dia. x 0.5mm 2sp Planetary Ball Mills Ball mill and sieve the

Ball mill and sieve the powder and apply only the 32~75 mircrons powder to the pressing die to avoid the damages

1mm or less in diameter

and HVMSS-SPC-2F

Polished surface: Substrate surface is EPI polished via a special CMP procedure with RA < 8 A

Package:    Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container

Al2O3 single crystal substrate , <0001> 4"Dia. x 0.5mm 2sp Planetary Ball Mills Ball mill and sieve the99. 996% High Purity, Monocrystalline Al2O3 Sapphire ( single crystal of Al2O3 ) is being used extensively as a substrate for III V nitrides and for many other epitaxial films. Normal0MicrosoftInternetExplorer4 Orientation: C axis[0001] ( + 0. 5o) with Standard Flat Orientation: C axis[0001] + 0. 5o Diameter: 100mm + 0. 1mm Thickness: 500um + 25 um Major Flat: A axis[11 20]+ 0. 5o Major Flat Length: 32. 5mm + 1. 5mm Surface Finish: Two sides polished